Direct growth of ZnO tetrapod on glass substrate by Chemical Vapor Deposition Technique

6th International Conference on Electronic Devices, Systems and Applications 2017

无线电电子学;工业技术

Fadzil, M.F.M.^1 ; Rahman, R.A.^1 ; Azhar, N.E.A.^1 ; Aziz, T.N.T.A.^1 ; Zulkifli, Z.^1

Nano-ElecTronic Center, Faculty of Electrical Engineering, UiTM Shah Alam, Malaysia^1

关键词: Chemical vapor;    Chemical vapour deposition;    Glass substrates;    IV characteristics;    Morphological structures;    Nitrogen gas flow;    Optimum growth temperature;    Zno nanotetrapod;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/340/1/012012/pdf
DOI  :  10.1088/1757-899X/340/1/012012

学科分类：工业工程学

来源: IOP

【 摘 要 】

This research demonstrates the growth of ZnO tetrapod structure on glass substrate for different types of flow gas and at different growth temperatures. The study on the morphological structure and electrical properties of ZnO thin film growth by Chemical Vapour Deposition (CVD) technique showed that the optimum growth temperature was obtained at 750°C with ZnO nanotetrapod morphological structure. Introducing Nitrogen gas flow during the growth process exhibited leg-to-leg linking ZnO tetrapods morphology. The electrical properties of ZnO tetrapods film were measured by using two point probes and it shows that, the sample growth in Ar and O2atmosphere have better I-V characteristic.