Structural, electrical, optical and magnetic properties of NiO/ZnO thin films

International Conference on Advances in Materials and Manufacturing Applications 2017

Sushmitha, V.^1 ; Maragatham, V.^1 ; Deepak Raj, P.^1 ; Sridharan, M.^1

Functional Nanomaterials and Devices Lab, Centre for Nanotechnology and Advanced Biomaterials, School of Electrical and Electronics Engineering, SASTRA University, Thanjavur

613401, India^1

关键词: Cleaned glass substrates;    Cubic phase;    Deposition time;    Diffraction planes;    Direct current magnetron sputtering;    In-vacuum;    Magnetic studies;    Optical and electrical properties;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/310/1/012022/pdf
DOI  :  10.1088/1757-899X/310/1/012022

来源: IOP

【 摘 要 】

Nickel oxide/Zinc oxide (NiO/ZnO) thin films have been deposited onto thoroughly cleaned glass substrates by reactive direct current (DC) magnetron sputtering technique and subsequently annealed at 300 °C for 3 h in vacuum. The NiO/ZnO thin films were then studied for their structural, optical and electrical properties. X-ray diffraction (XRD) pattern of ZnO and NiO showed the diffraction planes corresponding to hexagonal and cubic phase respectively. The optical properties showed that with the increase in the deposition time of NiO the energy band gap varied between 3.1 to 3.24 eV. Hence, by changing the deposition time of NiO the tuning of band gap and conductivity were achieved. The magnetic studies revealed the diamagnetic nature of the NiO/ZnO thin films.