The Effect of Substrate Temperature on Surface Modification of Polystyrene by using Nitrogen Plasma

4th International Conference on Advanced Materials Science and Technology

Novi, A.F.^1 ; Santjojo, D.J.D.H.^1 ; Masruroh^1

Jurusan Fisika FMIPA Univ. Brawijaya, Jl. Veteran, Malang

65145, Indonesia^1

关键词: Modification process;    Plasma generator;    Polystyrene thin films;    Substrate temperature;    Thin layers;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/202/1/012036/pdf
DOI  :  10.1088/1757-899X/202/1/012036

来源: IOP

【 摘 要 】

Studies on the effect of substrate temperature on the modification process of a thin layer of polystyrene samples deposited on glass by using spin coating technique have been conducted. The polystyrene thin film surface was modified by using nitrogen plasma generated in a vacuum reactor by a capacitive plasma generator with a frequency of 40 kHz. The substrate temperature was set by variation of 60, 70 and 80 °C during the modification process to determine the effect of substrate temperature on the level of roughness and hydrophobicity of the film. Observations were conducted by using optical microscopy, optical micro-profiler, and measuring the contact angle of liquid. The results showed a decrease in roughness due to modification at a temperature of 60 °C and 70 °C. On the other hand, the treatment at a temperature of 80 °C resulted in an increase of roughness. By measuring the contact angle, it was proven that hydrophobicity is not only influenced by the surface roughness of thin layers.