Photonic jet μ-etching: from static to dynamic process

3rd International Conference on Functional Materials Science 2016

Abdurrochman, A.^4 ; Lecler, S.^1 ; Zelgowski, J.^1 ; Mermet, F.^2 ; Fontaine, J.^3 ; Tumbelaka, B.Y.^5

ICube-IPP, Université de Strasbourg, CNRS, Illkirch, Strasbourg, France^1

IREPA LASER, Illkirch, Strasbourg, France^2

INSA de Strasbourg, Boulevard de la Victoire, Strasbourg, France^3

Department of Physics, UniversitasPadjadjaran, Jl. Raya Bandung-Sumedang KM. 21, Jatinangor, Sumedang

45363, Indonesia^4

Department of Electronics Engineering, UniversitasPadjadjaran, Jl. Raya Bandung-Sumedang KM. 21, Jatinangor, Sumedang

45363, Indonesia^5

关键词: Dielectric cylinder;    Dynamic process;    Electromagnetic plane wave;    Laser etching;    Nano seconds;    Near Infrared;    Spherical glass;    Sub-wavelength;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/196/1/012043/pdf
DOI  :  10.1088/1757-899X/196/1/012043

来源: IOP

【 摘 要 】

Photonic jet etching is a direct-laser etching method applying photonic jet phenomenon to concentrate the laser beam onto the proceeded material. We call photonic jet the phenomenon of the localized sub-wavelength propagative beam generated at the shadow-side surfaces of micro-scale dielectric cylinders or spheres, when they are illuminated by an electromagnetic plane-wave or laser beam. This concentration has made possible the laser to yield sub-μ etching marks, despite the laser was a near-infrared with nano-second pulses sources. We will present these achievements from the beginning when some spherical glasses were used for static etching to dynamic etching using an optical fiber with a semi-elliptical tip.