Research of niobium thin films with a predetermined thickness produced by RF magnetron sputtering

7th International Conference Radiation-thermal Effects and Processes in Inorganic Materials

材料科学;物理学

Polonyankin, D.A.^1 ; Blesman, A.I.^1 ; Postnikov, D.V.^1 ; Logacheva, A.I.^2 ; Logachev, I.A.^2 ; Teplouhov, A.A.^1 ; Fedorov, A.A.^3

Physics Department, Omsk State Technical University (OmSTU), 11 Mira Avenue, Omsk

644050, Russia^1

New Metallurgical Technologies Institute, Joint Stock Company Kompozit, 4 Pionerskaya St., Korolev

141070, Russia^2

Department of Mechanical Engineering Technology, Omsk State Technical University (OmSTU), 11 Mira Avenue, Omsk

644050, Russia^3

关键词: Experimental calibration;    Laser interference microscopies;    Niobium target;    Niobium thin film;    Nuclear medical imaging;    Practical importance;    rf-Magnetron sputtering;    Superconducting cavities;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/168/1/012069/pdf
DOI  :  10.1088/1757-899X/168/1/012069

学科分类：材料科学（综合）

来源: IOP

【 摘 要 】

Niobium and niobium thin films are widely used in various fields of modern science and technology: in the electronics industry, in a nuclear medical imaging technique, in the information technology, in superconducting cavities technology etc. The grain size of thin niobium films depends on its thickness and the film's stoichiometry can be varied as a function of thickness. Thus the problem of thickness control has a great practical importance in all fields of niobium films application. The focus of this study was to perform an experimental calibration of STC-2000A deposition controller for niobium target on ADVAVAC VSM-200 setup and to conduct a grain size, roughness and stoichiometry research by scanning electron microscopy, X-ray diffraction and laser interference microscopy of niobium films produced by RF magnetron sputtering with the thickness range from 200 nm to 400 nm and 50 nm step.