The influence of substrate temperature on the tribo- mechanical properties of chromium nitride thin films

7th International Conference on Advanced Concepts in Mechanical Engineering

Merie, V.V.^1 ; Negrea, G.^1 ; Modi, E.^1

Materials Science and Engineering Department, Technical University of Cluj-Napoca, Cluj-Napoca, Romania^1

关键词: Deposition process;    Discharge currents;    Mechanical and tribological properties;    Physical and chemical properties;    Reactive magnetron sputtering;    Silicon substrates;    Substrate temperature;    Tribological characteristics;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/147/1/012020/pdf
DOI  :  10.1088/1757-899X/147/1/012020

来源: IOP

【 摘 要 】

Different nitrides such as titanium nitryde, chromium nitride and so on qre used in a widespread range of applications such as cutting tools, medical implants, and microelectromechanical devices and all that due to their mechanical, physical and chemical properties. The aim of this study is to obtain chromium nitride thin films and to characterize them by atomic force microscopy investigations. The chromium nitride thin films were deposited by reactive magnetron sputtering on silicon substrates. During the deposition process, the discharge current, the argon and nitrogen flows, the pressure inside the chamber and the deposition time were kept constant. A chromium target with a purity of 99.95 % was used. Some of the films were deposited after a chromium buffer layer was previously deposited on the silicon substrate. The deposition was carried out when substrate temperature was at room temperature, at 300 and 500°C respectively. Once the films were deposited, atomic force microscopy investigations were performed in order to emphasize the influence of the substrate temperature on the topographical, mechanical and tribological characteristics. The results pointed out an important influence of the substrate temperature on topographical, mechanical and tribological properties of the investigated chromium nitride thin films.