3D Microfabrication Using Emulsion Mask Grayscale Photolithography Technique

2nd International Manufacturing Engineering Conference; 3rd Asia-Pacific Conference on Manufacturing Systems

Lee, Tze Pin^1 ; Mohamed, Khairudin^1

Nanofabrication and Functional Materials Research Group, School of Mechanical Engineering, Engineering Campus, Universiti Sains Malaysia, Nibong Tebal, Penang

14300, Malaysia^1

关键词: 3D micro-fabrication;    Gray scale photolithography;    High volume manufacturing;    Microelectromechanical system (MEMS);    Microoptical devices;    Next generation lithography;    Photolithography process;    Three-dimensional (3D) microstructures;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/114/1/012032/pdf
DOI  :  10.1088/1757-899X/114/1/012032

来源: IOP

【 摘 要 】

Recently, the rapid development of technology such as biochips, microfluidic, micro-optical devices and micro-electromechanical-systems (MEMS) demands the capability to create complex design of three-dimensional (3D) microstructures. In order to create 3D microstructures, the traditional photolithography process often requires multiple photomasks to form 3D pattern from several stacked photoresist layers. This fabrication method is extremely time consuming, low throughput, costly and complicated to conduct for high volume manufacturing scale. On the other hand, next generation lithography such as electron beam lithography (EBL), focused ion beam lithography (FIB) and extreme ultraviolet lithography (EUV) are however too costly and the machines require expertise to setup. Therefore, the purpose of this study is to develop a simplified method in producing 3D microstructures using single grayscale emulsion mask technique. By using this grayscale fabrication method, microstructures of thickness as high as 500μm and as low as 20μm are obtained in a single photolithography exposure. Finally, the fabrication of 3D microfluidic channel has been demonstrated by using this grayscale photolithographic technique.