Thin-film TiPbO3 varistors obtained by two-source magnetron sputtering

8th National Scientific Conference Advances in Electrotechnology (Postepy w Elektrotechnologii)

无线电电子学

Ziaja, J.^1 ; Lewandowski, M.^1

Department of Electrical Engineering Fundamentals, Wroclaw University of Technology, Poland^1

关键词: Current voltage;    Metallic targets;    Nonlinearity coefficient;    Power conditions;    Process gas;    Reactive process;    Two sources;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/113/1/012007/pdf
DOI  :  10.1088/1757-899X/113/1/012007

来源: IOP

【 摘 要 】

The paper presents the method of obtaining thin films of TiPbO3by two-source magnetron sputtering DC-M. The films were obtained in a reactive process of sputtering metallic targets of titanium (Ti) and lead (Pb). The research involved the impact of the time of sputtering of the respective targets on voltage-dependent resistance of the obtained films for different power conditions, pressures of process gases and the powers provided on the targets. The obtained nonlinearity coefficients and the current-voltage I(U) characteristics were within the following range.