Change Spectrum Characteristics Modification of Films Deposited by Magnetron Sputtering with the Assistance of Argon Ions Beam

International Scientific Conference on "Radiation-Thermal Effects and Processes in Inorganic Materials"

材料科学;物理学

Umnov, S.^1 ; Asainov, O.^1

Physical Technical Institute, Tomsk Polytechnic University, Lenina 2, bdg. 11, Tomsk

634050, Russia^1

关键词: Aluminum film;    Argon ion;    Argon ion beam;    Ion assistance;    Microstresses;    Microstructure defects;    Spectrum characteristic;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/81/1/012001/pdf
DOI  :  10.1088/1757-899X/81/1/012001

学科分类：材料科学（综合）

来源: IOP

【 摘 要 】

Thin aluminum films were prepared using the method of magnetron sputtering with and without argon ion beam assistance. The influence of argon ion beam on the reflectivity in the UV range and the structure of aluminum films was studied. The structure of the films was studied by transmission electron microscopy (TEM), X-ray diffractometry (XRD) and atomic- force microscope (AFM). The study has shown that the films deposed with the assistance of the argon ion beam have more significant microstresses associated with an increase of crystallites microstructure defects as compared to the films deposed without ion assistance. Comparison of the measured reflectivity of aluminum films deposed without and with the assistance of the ion beam has shown that the films characterized by a higher level of microstructure def ects have increased reflectivity in the UV range. The studies suggest that the defects of thin aluminum films crystal structure influence its optical properties.