Mechanical properties of titanium nitride films obtained by reactively sputtering with hot target

24th International Conference on Vacuum Technique and Technology

Babinova, R.V.^1 ; Smirnov, V.V.^1 ; Useenov, A.S.^2 ; Kravchuk, K.S.^2 ; Gladkikh, E.V.^2 ; Shapovalov, V.I.^1 ; Mylnikov, I.L.^1

Department of Physical Electronics and Technology, Saint-Petersburg State Electrotechnical University, LETI, Saint Petersburg

197376, Russia^1

Technological Institute for Superhard and Novel Carbon Materials, Troitsk, Moscow

142190, Russia^2

关键词: Discharge current density;    Grain size;    Nitrogen flow rates;    Surface image;    Titanium nitride films;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/872/1/012035/pdf
DOI  :  10.1088/1742-6596/872/1/012035

来源: IOP

【 摘 要 】

The mechanical properties and morphology of the surface of titanium nitride films deposited by reactive sputtering with a hot target have been investigated. It was founded that films synthesized at low nitrogen flow rate and at high discharge current density have the highest hardness (up to 30 GPa) and Young's modulus (up to 300 GPa). The analysis of films surface images obtained by atomic force microscopy is carried out. The typical grain size and its shape were determined. Films with the greatest hardness have the largest grains.