Influence of technological parameters on the mechanical properties of titanium nitride films deposited by hot target reactive sputtering

24th International Conference on Vacuum Technique and Technology

Kozin, A.A.^1 ; Shapovalov, V.I.^1 ; Smirnov, V.V.^1 ; Useinov, A.S.^2 ; Kravchuk, K.S.^2 ; Gladkikh, E.V.^2 ; Zavyalov, A.V.^1 ; Morozova, A.A.^1

Saint-Petersburg Electrotechnical University, LETI, Saint-Petersburg, Russia^1

Technological Institute of Superhard and Novel Carbon Materials, Troitsk Moscow, Russia^2

关键词: Discharge current density;    Face centered cubic lattice;    Hardness and modulus;    Nitrogen flow rates;    Reactive magnetron sputtering;    Technological parameters;    Titanium nitride films;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/872/1/012019/pdf
DOI  :  10.1088/1742-6596/872/1/012019

来源: IOP

【 摘 要 】

The impact of the discharge current density and nitrogen flow rate on the mechanical properties of titanium nitride films deposited by reactive magnetron sputtering of a hot target was studied. It was found that the films deposited at the highest discharge current density have the highest hardness and modulus of elasticity. These films have a texture with a significant predominance of the peak corresponding to the [111] direction in a face-centered cubic lattice of TiN.