Modelling of hot target reactive sputtering

13th International Conference on Films and Coatings

Shapovalov, V.I.^1 ; Smirnov, V.V.^1

Saint Petersburg Electrotechnical University LETI, Saint Petersburg

197376, Russia^1

关键词: Discharge current density;    Hot metal;    Nitrogen environment;    Physicochemical model;    Reactive magnetron sputtering;    System of equations;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/857/1/012039/pdf
DOI  :  10.1088/1742-6596/857/1/012039

来源: IOP

【 摘 要 】

The main foundations of the physicochemical models for reactive magnetron sputtering of a hot metal target in a nitrogen environment are described. The system of equations describing the model is solved for the titanium sputtering in a nitrogen environment. It is established that the width of the hysteresis loop decreases down to zero with an increase of the discharge current density.