BN coatings deposition by magnetron sputtering of B and BN targets in electron beam generated plasma

13th International Conference on Films and Coatings

Kamenetskikh, A.S.^1,2 ; Gavrilov, N.V.^1 ; Koryakova, O.V.^3 ; Cholakh, S.O.^2

Institute of Electrophysics, 106 Amundsen str., Yekaterinburg

620016, Russia^1

Ural Federal University, 19 Mira str., Yekaterinburg

620002, Russia^2

Institute of Organic Synthesis, 22 Sofia Kovalevskayastr., Yekaterinburg

620137, Russia^3

关键词: BN coating;    Electron-beam-generated plasmas;    Ion current density;    Magnetron discharges;    Nitride coating;    Reactive pulsed magnetron sputtering;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/857/1/012017/pdf
DOI  :  10.1088/1742-6596/857/1/012017

来源: IOP

【 摘 要 】

Boron nitride coatings were deposited by reactive pulsed magnetron sputtering of B and BN targets (50 kHz, 10 μs for B; 13.56 MHz for BN) at 2-20 mA/cm2ion current density on the substrate. The effect of electron beam generated plasma on characteristics of magnetron discharge and phase composition of coatings was studied.