Coating synthesis on dielectric substrates assisted by pulsed beams of high-energy gas atoms

5th International Congress on Energy Fluxes and Radiation Effects 2016

Grigoriev, S.N.^1 ; Melnik, Yu A.^1 ; Metel, A.S.^1

Moscow State University of Technology STANKIN, 1 Vadkovsky per., Moscow

127055, Russia^1

关键词: Aluminum oxide substrates;    Charge exchange collision;    Coating adhesion;    Dielectric substrates;    High voltage pulse;    Magnetron discharges;    Substrate atom;    Vacuum chambers;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/830/1/012098/pdf
DOI  :  10.1088/1742-6596/830/1/012098

来源: IOP

【 摘 要 】

Titanium nitride and aluminum nitride coatings have been deposited on glass and aluminum oxide substrates in a flow of metal atoms accompanied by high-energy gas atoms. The metal atoms are produced due to sputtering of a flat rectangular magnetron target. The gas atoms with energy up to 25 keV are produced due to charge exchange collisions of ions extracted from the magnetron discharge plasma and accelerated by high-voltage pulses applied to a flat grid parallel to the target. The metal atoms pass through the grid and deposit on the substrate. Conjunction of their trajectories with those of gas atoms bombarding the growing coating enables the coating synthesis on complex-shape dielectric products planetary rotating inside the vacuum chamber. Mixing high-energy gas atoms of the coating and substrate atoms substantially improves the coating adhesion.