Virtual Metrology applied in Run-to-Run Control for a Chemical Mechanical Planarization process

13th European Workshop on Advanced Control and Diagnosis

Jebri, M.A.^1 ; El Adel, E.M.^1 ; Graton, G.^1,2 ; Ouladsine, M.^1 ; Pinaton, J.^3

Aix-Marseille Université, CNRS, ENSAM, Universitéde Toulon, LSIS UMR 7296, Av. Normandie-Niemen, Marseille

13397, France^1

Ecole Centrale Marseille, Technopôle de Chateau-Gombert, 38 rue Frédéric Joliot-Curie, Marseille Cedex 13

F-13451, France^2

STMicroelectronics, ZI Rousset, Rousset Cedex

13106, France^3

关键词: Chemical-mechanical planarization process;    Industrial partners;    Just-in-time learning;    Quality improvement;    Run-to-run control;    Sampling strategies;    Semiconductor manufacturing;    STMicroelectronics;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/783/1/012042/pdf
DOI  :  10.1088/1742-6596/783/1/012042

来源: IOP

【 摘 要 】

This paper deals with missing data in semiconductor manufacturing derived from a measurement sampling strategies. The idea is to construct a virtual metrology module to estimate non measured variables using a new modified Just-In-Time Learning approach (JITL). The aim of this paper is to integrate estimated data into product control loop. In collaboration with our industrial partner STMicroelectronics Rousset, the accuracy of the proposed method is illustrated by using industrial data-sets derived from Chemical Mechanical Planarization (CMP) process that enables us to compare results obtained with the classical and the modified version of JITL approach. Then, the contribution of the estimated data is shown in product quality improvement.