Synthesis and characterization of thin amorphous carbon films doped with nitrogen on (001) Si substrates

INERA Conference: Vapor Phase Technologies for Metal Oxide and Carbon Nanostructures

物理学;材料科学

Balchev, I.^1 ; Tzvetkova, Kr^1 ; Kolev, S.^1 ; Terziiska, P.^2 ; Szekeres, A.^2 ; Miloushev, I.^2 ; Tenev, T.^2 ; Antonova, K.^2 ; Peyeva, R.^2 ; Ivanova, T.^3 ; Avramova, I.^4 ; Tzvetkov, M.^5 ; Avdreev, G.^5 ; Valcheva, E.^6 ; Milenov, T.^1 ; Tinchev, S.^1

Institute of Electronics, Bulgarian Academy of Sciences, 72 Tzarigradsko Shausee Blvd., Sofia

1784, Bulgaria^1

Institute of Solid State Physics, Bulgarian Academy of Sciences, 72 Tzarigradsko Shausee Blvd., Sofia

1784, Bulgaria^2

Central Laboratory of Solar Energy and New Energy Sources, Bulgarian Academy of Sciences, Sofia

1784, Bulgaria^3

Institute of General and Inorganic Chemistry, Bulgarian Academy of Sciences, Acad. G. Bonchev Str., bl. 11, Sofia

1113, Bulgaria^4

R. Kaishev Institute of Physical Chemistry, Bulgarian Academy of Sciences, Acad. G. Bonchev Str., bl. 11, Sofia

1113, Bulgaria^5

Faculty of Physics, Sofia University, 5 James Bourchier Blvd., Sofia

1164, Bulgaria^6

关键词: Deposited layer;    Ellipsometric measurements;    Plasma enhanced chemical vapor depositions (PE CVD);    Raman spectroscopic study;    Si substrates;    Spectral ellipsometry;    Synthesis and characterizations;    Transition energy;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/764/1/012013/pdf
DOI  :  10.1088/1742-6596/764/1/012013

学科分类：材料科学（综合）

来源: IOP

【 摘 要 】

We synthesized undoped as well as up to 6 at.% nitrogen (N) doped thin amorphous carbon (α-C) films by plasma- enhanced chemical vapor deposition (PECVD) method. The source of carbon/carbon containing radicals was benzene (C6H6) in Ar gas- mixture. The obtained thin films were studied by optical microscopy, X-ray powder diffraction, UV-VIS- NIR Spectral Ellipsometry, IR and Raman spectroscopic studies as well as by X-ray photoelectron spectroscopies (XPS). We established by XPS that the deposited layers consist of a mix of sp2and sp3hybridized carbon. The films are amorphous as it was shown by the measured XRD patterns. The ellipsometric measurements enabled calculation of transition energies and the complex results showed that films with thickness of 15- 120 nm and different properties can be obtained by this technique.