Boron carbide coating deposition on tungsten substrates from atomic fluxes of boron and carbon

19th Conference on Plasma Surface Interactions

Sadovskiy, Y.^1 ; Begrambekov, L.^1 ; Ayrapetov, A.^1 ; Gretskaya, I.^1 ; Grunin, A.^1 ; Dyachenko, M.^1 ; Puntakov, N.^1

National Research, Nuclear University, MEPhI (Moscow Engineering Physics Institute), 31 Kashirskoe highway, Moscow

115409, Russia^1

关键词: Boron and carbons;    Boron carbide coatings;    Coating adhesion;    Coating deposition;    High power density;    Material testing;    Sputtering target;    Tungsten substrate;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/748/1/012003/pdf
DOI  :  10.1088/1742-6596/748/1/012003

来源: IOP

【 摘 要 】

A device used for both coating deposition and material testing is presented in the paper. By using lock chambers, sputtering targets are easily exchanged with sample holder thus allowing testing of deposited samples with high power density electron or ion beams. Boron carbide coatings were deposited on tungsten samples. Methods of increasing coating adhesion are described in the paper. 2 μm boron carbide coatings sustained 450 heating cycles from 100 to 900 C. Ion beam tests have shown satisfactory results.