Influence of ion-plasma treatment on residual stress in the microcantilever

3rd International School and Conference on Optoelectronics, Photonics, Engineering and Nanostructures (Saint Petersburg OPEN 2016)

Babushkin, A.S.^1 ; Uvarov, I.V.^1 ; Amirov, I.I.^1

Yaroslavl Branch, Institute of Physics and Technology RAS, 21 Universitetskaya Street, Yaroslavl

150007, Russia^1

关键词: Annealing temperatures;    Ion plasma treatment;    Mechanical stress;    Micro-cantilevers;    Vacuum thermal annealing;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/741/1/012208/pdf
DOI  :  10.1088/1742-6596/741/1/012208

来源: IOP

【 摘 要 】

The influence of ion-plasma treatment on residual stress in the microcantilever is investigated. The ability of treatment with energy below the sputtering threshold to affect the mechanical stress is shown. It is also demonstrated that a preliminary vacuum thermal annealing of samples reduces the influence of ion bombardment on the residual stress. With the increase of the annealing temperature the effect of ion bombardment disappears.