Beyond Extreme Ultra Violet (BEUV) Radiation from Spherically symmetrical High-Z plasmas

8th International Conference on Inertial Fusion Sciences and Applications

Yoshida, Kensuke^1 ; Fujioka, Shinsuke^1 ; Higashiguchi, Takeshi^2 ; Ugomori, Teruyuki^1 ; Tanaka, Nozomi^1 ; Kawasaki, Masato^2 ; Suzuki, Yuhei^2 ; Suzuki, Chihiro^3 ; Tomita, Kentaro^4 ; Hirose, Ryouichi^5 ; Eshima, Takeo^5 ; Ohashi, Hayato^2 ; Nishikino, Masaharu^6 ; Scally, Enda^7 ; Nshimura, Hiroaki^1 ; Azechi, Hiroshi^1 ; O'Sullivan, Gerard^7

Institute of Laser Engineering, Osaka University, 2-6 Yamadaoka, Osaka, Suita

565-0871, Japan^1

Utsunomiya University, 350 Minemachi, Tochigi, Utsunomiya

321-8505, Japan^2

National Institute for Fusion Science, 322-6 Oroshicyo, Tokishi, Gihu

509-5292, Japan^3

Kyusyu University, 6-10-1 Hakozaki, Higashiku, Fukuokashi

812-8581, Japan^4

Tohoku University, 2-1-1 Katahira, Aobaku, Sendaishi, Miyagi

980-8577, Japan^5

Japan Atomic Energy Agency, 4-49 Muramatsu, Toukaimura, Nakagun, Ibaraki

319-1184, Japan^6

University College Dublin (UCD), Belfield-Dublin, 4, Ireland^7

关键词: Beyond extreme ultraviolets (BEUV);    Complex structure;    Experimental database;    Extreme ultraviolets;    Key technologies;    Laser intensities;    Shorter wavelength;    Transmission gratings;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/688/1/012046/pdf
DOI  :  10.1088/1742-6596/688/1/012046

来源: IOP

【 摘 要 】

Photo-lithography is a key technology for volume manufacture of high performance and compact semiconductor devices. Smaller and more complex structures can be fabricated by using shorter wavelength light in the photolithography. One of the most critical issues in development of the next generation photo-lithography is to increase energy conversion efficiency (CE) from laser to shorter wavelength light. Experimental database of beyond extreme ultraviolet (BEUV) radiation was obtained by using spherically symmetrical high-Z plasmas generated with spherically allocated laser beams. Absolute energy and spectra of BEUV light emitted from Tb, Gd, and Mo plasmas were measured with a absolutely calibrated BEUV calorimeter and a transmission grating spectrometer. 1.0 x 1012W/cm2is the optimal laser intensity to produced efficient BEUV light source plasmas with Tb and Gd targets. Maximum CE is achieved at 0.8% that is two times higher than the published CEs obtained with planar targets.