Spectroscopy for identification of plasma sources for lithography and water window imaging

29th International Conference on Photonic, Electronic, and Atomic Collisions

O'Sullivan, Gerry^1 ; Dunne, Padraig^1 ; Higashiguchi, Takeshi^2 ; Li, Bowen^3 ; Lokasani, Ragava^1 ; Long, Elaine^1 ; Ohashi, Hayato^4 ; O'Reilly, Fergal^1 ; Sheridan, Paul^1 ; Sheil, John^1 ; Sokell, Emma^1 ; Suzuki, Chihiro^5 ; Wu, Tao^1

School of Physics, University College Dublin Belfield, Dublin 4, Ireland^1

Department of Advanced Interdisciplinary Science, Center for Optical Research (CORE), Utsunomiya University, Yoto 7-1-2, Utsunomiya, Tochigi

321-8585, Japan^2

School of Nuclear Science and Technology, Lanzhou University, Lanzhou

730000, China^3

Graduate School of Science and Engineering for Research, University of Toyama, Toyama, Toyama

930-8555, Japan^4

National Institute for Fusion Science, 322-6 Oroshi-cho, Toki, Gifu

509-5292, Japan^5

关键词: Cell tomography;    Extreme ultraviolets;    Multi-layer mirrors;    Potential sources;    Soft-X-ray spectra;    Water window;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/635/9/092037/pdf
DOI  :  10.1088/1742-6596/635/9/092037

来源: IOP

【 摘 要 】

We report on the result of an extensive study of the extreme ultraviolet (EUV) and soft x-ray spectra from laser produced plasmas of a number of medium and high Z metals undertaken to identify potential sources for use with multilayer mirrors as sources for lithography and water window imaging and cell tomography.