Spectroscopy for identification of plasma sources for lithography and water window imaging

29th International Conference on Photonic, Electronic, and Atomic Collisions

O'Sullivan, Gerry^1 ; Dunne, Padraig^1 ; Higashiguchi, Takeshi^2 ; Li, Bowen^3 ; Liu, Luning^1 ; Lokasani, Ragava^1 ; Long, Elaine^1 ; Ohashi, Hayato^4 ; O'Reilly, Fergal^1 ; Sheridan, Paul^1 ; Sokell, Emma^1 ; Suzuki, Chihiro^5 ; Wu, Tao^1

School of Physics, University College Dublin, Belfield, Dublin 4, Ireland^1

Department of Electrical and Electronic Engineering, Faculty of Engineering, Utsunomiya University, Yoto 7-1-2, Utsunomiya, Tochigi

321-8585, Japan^2

School of Nuclear Science and Technology, Lanzhou University, Lanzhou

730000, China^3

Graduate School of Science and Engineering for Research, University of Toyama, Toyama

930-8555, Japan^4

National Institute for Fusion Science, 322-6 Oroshi-cho, Toki, Gifu

509-5292, Japan^5

关键词: Biological imaging;    Extreme ultraviolets;    High-resolution imaging;    Identification of sources;    Multi-layer mirrors;    Potential sources;    Surface patterning;    Unresolved transition array;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/635/1/012026/pdf
DOI  :  10.1088/1742-6596/635/1/012026

来源: IOP

【 摘 要 】

The identification of sources for applications that include nanolithography, surface patterning and high resolution imaging is the focus of a considerable activity in the extreme ultraviolet (EUV) or soft x-ray (SXR) spectral regions. We report on the result of a study of the spectra from laser produced plasmas of a number of medium and high Z metals undertaken in order to identify potential sources for use with available multilayer mirrors. The main focus was the study of unresolved transition arrays emitted from ions with 3d, 4d and 4f valence subshells that emit strongly in the water window (2.34-4.38 nm).and that could be used for biological imaging or cell tomography.