Spectroscopic analysis of photo-induced deformation of amorphous carbon nitride films

6th International Conference on Optical, Optoelectronic and Photonic Materials and Applications 2014

Harata, T.^1 ; Aono, M.^1 ; Tamura, N.^1 ; Kitazawa, N.^1 ; Watanabe, Y.^1

Department of Materials Science and Engineering, National Defense Academy, Hashirimizu 1-10-20, Kanagawa, Yokosuka

239-8686, Japan^1

关键词: Amorphous carbon nitride films;    Bending angle;    Bending curvature;    Graphite target;    Photo-induced;    Reactive radio-frequency magnetron sputtering;    Rectangular-shaped;    Ultra-thin;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/619/1/012007/pdf
DOI  :  10.1088/1742-6596/619/1/012007

来源: IOP

【 摘 要 】

Reversible photo-induced deformation of amorphous carbon nitride (a-CNx) films was investigated. The films were deposited at 400 and 600 °C on a rectangular shaped ultrathin SiO2substrate by reactive radio frequency magnetron sputtering with graphite target and pure N2gas. The amount of deformation change was estimated from bending curvature of a-CNx/SiO2bimorph structure. For the film deposited at 400 °C, it bent toward the film side under illumination. Photo-induced deformation of the film estimated from the bending angle was observed in the excitation energy of 1.77 to 3.35 eV. The maximum deformation was observed under illumination of 2.6 eV which corresponds with π-π∗ bond of carbon nitride. In contrast, the deformation was hardly observed in the films deposited at 600oC.The difference in these two films was probably due to difference in sp2bonding and termination structures.