Copper deposition on fabrics by rf plasma sputtering for medical applications

15th Latin American Workshop on Plasma Physics; 21st IAEA TM on Research Using Small Fusion Devices

Segura, G.^1 ; Guzmán, P.^1 ; Zuñiga, P.^2 ; Chaves, S.^2 ; Barrantes, Y.^1 ; Navarro, G.^1 ; Asenjo, J.^1 ; Guadamuz, S.^1 ; Vargas, V.I.^1 ; Chaves, J.^2

Plasma Laboratory for Fusion Energy and Applications, Instituto Tecnológico de Costa Rica, Cartago, Costa Rica^1

Laboratorio Institutional de Nanotecnología, Instituto Tecnológico de Costa Rica, Cartago, Costa Rica^2

关键词: Antimicrobial action;    Copper deposition;    Discharge pressures;    Growth of bacteria;    Hospital settings;    Reference strains;    RF plasma sputtering;    Sputtering time;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/591/1/012046/pdf
DOI  :  10.1088/1742-6596/591/1/012046

来源: IOP

【 摘 要 】

The present work is about preparation and characterization of RF sputtered Cu films on cotton by the usage of a Magnetron Sputter Source and 99.995% purity Cu target at room temperature. Cotton fabric samples of 1, 2 and 4 min of sputtering time at discharge pressure of 1×10-2Torr and distance between target and sample of 8 cm were used. The main goal was to qualitatively test the antimicrobial action of copper on fabrics. For that purpose, a reference strain of Escherichia Coli ATCC 35218 that were grown in TSA plates was implemented. Results indicated a decrease in the growth of bacteria by contact with Cu; for fabric samples with longer sputtering presented lower development of E. coli colonies. The scope of this research focused on using these new textiles in health field, for example socks can be made with this textile for the treatment of athlete's foot and the use in pajamas, sheets, pillow covers and robes in hospital setting for reducing the spread of microorganisms.