Investigation of the ion beam emission from a pulsed power plasma device

15th International Congress on Plasma Physics; 13th Latin American Workshop on Plasma Physics

Henríquez, A.^1 ; Bhuyan, H.^1 ; Favre, M.^1 ; Retamal, M.J.^1 ; Volkmann, U.^1 ; Wyndham, E.^1 ; Chuaqui, H.^1

Pontificia Universidad Catolica de Chile, Departamento de Fisica, Casilla 306, Santiago 22, Chile^1

关键词: Characteristic energy;    Fundamental physics;    Integrated measurements;    Ion beam emission;    Mather type plasma focus devices;    Plasma focus devices;    Pulsed-power plasmas;    Thin-film depositions;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/511/1/012073/pdf
DOI  :  10.1088/1742-6596/511/1/012073

来源: IOP

【 摘 要 】

Plasma Focus (PF) devices are well known as ion beam sources with characteristic energy among the hundreds of keV to tens of MeV. The information on ion beam energy, ion distribution and composition is essential from the viewpoint of understanding fundamental physics behind their production and acceleration and also their applications in various fields, such as surface properties modification, ion implantation, thin film deposition, semiconductor doping and ion assisted coating. An investigation from a low energy, 1.8 kJ 160 kA, Mather type plasma focus device operating with nitrogen using CR-39 detectors was conducted to study the emission of ions at different angular positions. Tracks on CR-39 detectors at different angular positions reveal the existence of angular ion anisotropy. The results obtained are comparable with the time integrated measurements using FC. Preliminary results of this work are presented.