Spectroscopic Characterization Of RF Hydrocarbon Plasmas For DLC Coatings

15th International Congress on Plasma Physics; 13th Latin American Workshop on Plasma Physics

Guzmán, F.^1 ; Ruiz, M.^1 ; Valderrama, E.^1,2 ; Favre, M.^1 ; Bhuyan, H.^1 ; Wynham, E.S.^1 ; Chuaqui, H.^1

Departamento de Física, Pontificia Universidad Católica de Chile, Casilla 306, Santiago 22, Chile^1

Alameda Applied Sciences Corporation, 3077 Teagarden Street, San Leandro, CA 94577, United States^2

关键词: Capacitively coupled;    Catalyzer precursors;    Identical conditions;    Molecular species;    Operational conditions;    Optical emission spectroscopies (OES);    Spatial resolution;    Spectroscopic characterization;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/511/1/012017/pdf
DOI  :  10.1088/1742-6596/511/1/012017

来源: IOP

【 摘 要 】

In previous experiments, using a RF plasma generator at low power, we have grown diamond like carbon films (DLC), using a hydrocarbon plasma, without the use of a catalyzer precursor[1]. In order to better understand the relationship between the properties of the resulting DLC films and the RF plasma parameters, we have performed detailed optical emission spectroscopy (OES) observations of RF hydrocarbon plasmas, under identical conditions to those used for DLC films growth. The experiments were performed in a low power capacitively coupled RF (13.6 MHz) plasma generator, operating at 30 W. Working gases were acetylene and hydrogen. The optical emission of the RF plasma was recorded, under different operational conditions, with a spectrometer, and an f-f light collection arrangement was used to achieve spatial resolution. The relative emission of the different molecular species was found to depend on the C2H2:H2 flow ratio. Based on the OES observations, we present a description of plasma conditions in a low power RF hydrocarbon plasma reactor.