Growth of (001) or (115) Bi-2201 Thin Films by Spin Coating and MOCVD Targeting Future Electronics Applications

11th European Conference on Applied Superconductivity

Endo, K.^1 ; Kaneko, T.^1 ; Moriguchi, T.^1 ; Takemata, H.^1 ; Takada, T.^1 ; Ikenaga, N.^1 ; Badica, P.^2

Research Laboratory for Integrated Technological Systems, Kanazawa Institute of Technology (KIT), Yatsukaho, Ishikawa

924-0838, Japan^1

National Institute of Materials Physics, Atomistilor 105bis, Magurele

077125, Romania^2

关键词: Bi-2201;    C-axis and non c-axis thin films;    Chemical routes;    Electronics applications;    SrTiO3 substrates;    Thermal-annealing;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/507/1/012011/pdf
DOI  :  10.1088/1742-6596/507/1/012011

来源: IOP

【 摘 要 】

Thin films of Bi2Sr2CuO6(Bi-2201) with (001) or (115) orientation were grown on SrTiO3substrates. These films are expected to be useful as component films of heterostructures and devices (e.g. as insulators). We used two chemical routes, namely spin coating followed by thermal annealing and MOCVD. For both routes we demonstrated growth of c-axis and non-c axis thin films depending on the selected orientation of the SrTiO3substrate. To our knowledge, films of (115) Bi2201 obtained by spin coating or MOCVD are reported for the first time.