1st Conference on Light and Particle Beams in Materials Science 2013 | |
DNA damage by soft X-ray exposure at oxygen K-edge | |
物理学;材料科学 | |
Sugaya, Y.^1,2 ; Narita, A.^2 ; Fujii, K.^2 ; Yokoya, A.^1,2 | |
Ibaraki University, Mito Ibaraki 310-8512, Japan^1 | |
ASRC, JAEA, Tokyo Ibaraki 319-1195, Japan^2 | |
关键词: Biochemical treatments; K-shell electrons; K-shell ionization; Oxygen atom; Oxygen K-edge; Photoabsorptions; Physico-chemical mechanisms; Strand breaks; | |
Others : https://iopscience.iop.org/article/10.1088/1742-6596/502/1/012040/pdf DOI : 10.1088/1742-6596/502/1/012040 |
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学科分类:材料科学(综合) | |
来源: IOP | |
【 摘 要 】
In order to obtain detailed insights into the physicochemical mechanism of DNA damage induction in terms of photoabsorption modes, we have prepared thin DNA films of closed circular plasmid (pUC18) on a cover slip without any additives. Using this film, we have performed preliminary experiments by exposing to soft X-rays with energies around oxygen K-shell ionization threshold. The DNA damage yields of strand breaks and base lesions or AP sites were quantified by biochemical treatments. We confirmed that the DNA film can work as a specimen irradiation. The DNA damage yields induced by π* excitation of a K-shell electron of oxygen atoms in DNA were significantly larger those for oxygen K-ionization.
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