Chemical Synthesis of Silicon Nanosheets from layered calcium disilicide

3rd International Meeting on Silicene

Ali, Mustapha Ait^1 ; Tchalala, Mohamed Rachid^1,2

Laboratoire de Chimie de Coordination et Catalyse, Département de Chimie, Université Cadi Ayyad, Marrakech, 40001, Morocco^1

Institut des Sciences Moléculaires d'Orsay, ISMO-CNRS, Université Paris-Sud, Bâtiment 210, 91405 Orsay, France^2

关键词: Calcium disilicide;    Chemical exfoliations;    Fundamental units;    Gram-scale quantity;    Mass production;    Sheet structure;    Synthetic methods;    Top down approaches;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/491/1/012009/pdf
DOI  :  10.1088/1742-6596/491/1/012009

来源: IOP

【 摘 要 】

The synthesis of silicon nanosheets (SiNSs) without using conventional vacuum processes and vapor deposition is challenging and is anticipated to receive significant attention for a wide range of applications. Thereby, mass production of silicon nanosheets with low cost can be achieved using top-down approach starting from materials including a 2D sheet structure as a fundamental unit. We have recently, developed a soft synthetic method for the preparation of silicon sheets in gram-scale quantities by redox-assisted chemical exfoliation (RACE) of calcium disilicide (CaSi2). In this review, we will present chemical methods for the synthesis and modification of silicon sheets.