Atomic structure of the ()R30° of silicene on Ag(111) surface

3rd International Meeting on Silicene

Enriquez, Hanna^1 ; Kara, Abdelkader^2 ; Mayne, Andrew J^1 ; Dujardin, Gérald^1 ; Jamgotchian, Haik^3 ; Aufray, Bernard^3 ; Oughaddou, Hamid^1,4

Institut des Sciences Moléculaires d'Orsay, ISMO-CNRS, Université Paris-Sud, Bâtiment 210, 91405 Orsay, France^1

Department of Physics, University of Central Florida, Orlando, FL, 32816, United States^2

CINaM-UPR, CNRS, Campus de Luminy, 13288 Marseille Cedex 09 7325, France^3

Département de Physique, Bâtiment Neuville II, 5 Mail Gay-Lussac, 95031 Neuville sur Oise, Cergy-Pontoise cedex, France^4

关键词: Ag(111);    Ag(111) surface;    Ordered phasis;    Substrate orientation;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/491/1/012004/pdf
DOI  :  10.1088/1742-6596/491/1/012004

来源: IOP

【 摘 要 】

The deposition of one monolayer of silicon on a Ag(111) substrate induces the formation of silicene structures exhibiting different ordered phases, including a (2√3×2√3)R30°,a (4×4) and a (√13×√13)R13:9° superstructures. In this paper we focus on the (2√3×√3)R30° phase. Using a combination of scanning tunneling microscopy and LEED observations, we show that this phase corresponds to a 11° rotation of the silicene sheet relative to the substrate orientation.