Temperature Behavior in a Tandem Type of Modulated Induction Thermal Plasma for Materials Processings

11th Asia Pacific Conference on Plasma Science and Technology;25th Symposium on Plasma Science for Materials

Kuraishi, Katsuya^1 ; Akao, Mika^1 ; Tanaka, Yasunori^1,2 ; Uesugi, Yoshihiko^1,2 ; Ishijima, Tatsuo^2

Faculty of Electrical and Computer Engineering, Kanazawa University, Kakuma, Kanazawa 920-1192, Japan^1

Research Center for Sustainable Energy and Technology, Kanazawa University, Kakuma, Kanazawa 920-1192, Japan^2

关键词: Control temperatures;    Excitation temperature;    Induction thermal plasma;    Materials processing;    Reaction fields;    Temperature behavior;    Thermal plasma;    Time variations;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/441/1/012016/pdf
DOI  :  10.1088/1742-6596/441/1/012016

来源: IOP

【 摘 要 】

A tandem type of modulated induction thermal plasma (Tandem-MITP) system has been developed using two rf power supplies and two coils for one plasma torch. This system was developed to control temperature and reaction fields temporally and spatially in a thermal plasma. The modulation of each coil current can change the thermal plasma temperature in the torch temporally and spatially. Time variation of Ar excitation temperature was estimated by the two-line method using Ar atomic lines. The Tandem-MITP could be established successfully, and the Ar excitation temperature in the thermal plasma could be controlled temporally and spatially by the developed system.