会议论文详细信息
2019 2nd International Conference on Advanced Materials, Intelligent Manufacturing and Automation
Numerical Simulation of The Interaction Between Electromagnetic Wave and Plasma
Zhang, Wenyuan^1 ; Xu, Haojun^1 ; Wei, Xiaolong^1 ; Han, Xinmin^1 ; Song, Zhijie^1
Science and Technology on Plasma Dynamics Laboratory, Air Force Engineering University, Xi'an, Shanxi
710038, China^1
关键词: Band attenuation;    Gas pressures;    Inductively coupled plasma (ICP);    Reflection waves;    Simulation model;    Source points;    Time domain;    Wave attenuation;   
Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/569/2/022032/pdf
DOI  :  10.1088/1757-899X/569/2/022032
来源: IOP
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【 摘 要 】

With a view to the potential application on stealth design of inductively coupled plasma (ICP), the simulation model of ICP scattering parameters was established by using COMSOL and ZT-FDTD method. Some detail of the interaction between electromagnetic wave and plasma in time domain which was difficult to be observed in experiment was revealed in the simulation. Wave source points composed of continuous reflection waves in the plasma were observed. The position of the wave source depends on the spatial distribution of the electron density peak. The influence of gas pressure (10 mTorr∼1 Torr) and power (300∼700 W) on attenuation efficiency was studied. The wave attenuation in plasma is characterized by band attenuation. The attenuation significantly improved with the increase of pressure and thickness monotonically. As the power increased, both the band width and amplitude of wave attenuation increased.

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