Design, Modeling and Analysis of a XY Nanopositioning Stage for High Speed Scanning

4th International Conference on Manufacturing, Material and Metallurgical Engineering

Lin, Shenglong^1 ; Zhang, Xianmin^1 ; Zhu, Benliang^1

Guangdong Province Key Laboratory of Precision Equipment and Manufacturing Technology, South China University of Technology, Guangdong Guangzhou

510640, China^1

关键词: Analytical results;    Cross-couplings;    Design objectives;    Doubly clamped beam;    High speed scanning;    Model and analysis;    Nano-positioning stages;    Stiffness model;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/538/1/012043/pdf
DOI  :  10.1088/1757-899X/538/1/012043

来源: IOP

【 摘 要 】

In order to increase the imaging speed of scanning probe microscopy (SPM), especially atomic force microscopy (AFM) where needs a high-bandwidth moving stage possessing high resonant frequency and low cross-coupling, the paper proposes a kind of XY nanopositioning stage achieving about 10kHz resonant frequency, 15um×15um workspace and well decoupled performance. Considering the design objective, a compliant nanopositioning stage is built with doubly clamped beam and parallelogram hybrid beam for overcoming the problem of low natural frequency and cross-coupling performance. By establishing mathematical model of the proposed stage including stiffness model and resonant frequencies model, the paper solves the highest natural frequency with its optimal dimensions of beams by applying optimization. Finally the designed stage is imported to Workbench for the validation of mathematical model by simulation, where presents the FEA results can nicely match the analytical results.