Mechanical and tribological characteristics of a-C:H:SiOx films formed by PACVD on titanium alloy VT1-0

International Scientific and Technical Youth Conference "Perspective Materials of Constructional and Medical Purpose"

材料科学;医药卫生

Grenadyorov, A.S.^1 ; Solovyev, A.A.^1^2 ; Oskomov, K.V.^1 ; Yaroslavtseva, O.A.^2

Institute of High Current Electronics, SBRAS, 2/3 Akademichesky Avenue, Tomsk

634055, Russia^1

National Research Tomsk Polytechnic University, 30 Lenina Avenue, Tomsk

634050, Russia^2

关键词: Chemical deposition method;    Deformation resistance;    Elasticity moduli;    Friction coefficients;    Mechanical and tribological properties;    Plasticity indices;    Surface hardness;    Tribological characteristics;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/511/1/012019/pdf
DOI  :  10.1088/1757-899X/511/1/012019

来源: IOP

【 摘 要 】

This paper is devoted to the study of the mechanical and tribological properties of a-C:H:SiOx films deposited on a titanium alloy VT1-0 by a plasma chemical deposition method using pulsed bipolar bias voltage. It was shown that after deposition of 2 μm-thick a-C:H:SiOx film on a titanium alloy VT1-0 sample, the root-mean-square surface roughness Rq measured using atomic force microscopy decreased from 74 to 50 nm compared to the original substrate. The surface hardness H measured using nanoindentation increased from 3.3 to 12.4 GPa with an almost unchanged elasticity modulus E. As a result, the plasticity index (H/E) of titanium samples increased from 0.03 to 0.11, and the plastic deformation resistance (H 3/E 2) increased from 3 to 156 MPa. Deposition of a-C:H:SiOx film on the titanium alloy VT1-0 surface makes possible to reduce the friction coefficient from 0.3-0.6 to 0.1 and the wear rate from 6 • 10-4 to 7•10-6 mm3/Nm.