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1 High χ block copolymers for sub 20 nm pitch patterning: synthesis, solvent annealing, directed self assembly, and selective block removal [学位论文]

作者:Jarnagin, Nathan D., Henderson, Clifford L. Tolbert, Laren M. Chemistry and Biochemistry Collard, David Reynolds, John Bucknall, David, Henderson, Clifford L.   

论文开放时间:2013

关键词:Block copolymer;Phase separation;...

培养单位:University:Georgia Institute of Technology

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