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| Thin film resistance to hydrofluoric acid etch with applications in monolithic microelectronic/MEMS integration |
| Thin films;Hydrofluoric acid;Microelectronics Materials;Microelectromechanical systems Materials |
| McKenzie, Todd G. ; Electrical and Computer Engineering |
| University:Georgia Institute of Technology |
| Department:Electrical and Computer Engineering |
| 关键词:
Thin films;
Hydrofluoric acid;
Microelectronics Materials;
Microelectromechanical systems Materials;
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| Others : https://smartech.gatech.edu/bitstream/1853/5359/1/mckenzie_todd_g_200312_ms.pdf |
| 美国|英语 |
| 来源:
SMARTech Repository |
 PDF
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