Development and characterization of III-Nitride bipolar devices

III-N devices;Compound semiconductor

Kao, Tsung-Ting ; Shen, Shyh-Chiang Electrical and Computer Engineering Dupuis, Russell D. Yoder, Paul D. Bakir, Muhannad S. Graham, Samuel ; Shen, Shyh-Chiang

University:Georgia Institute of Technology

Department:Electrical and Computer Engineering

关键词: III-N devices;    Compound semiconductor;   

Others  :  https://smartech.gatech.edu/bitstream/1853/59114/1/KAO-DISSERTATION-2016.pdf

美国|英语

来源: SMARTech Repository

【 摘 要 】

III-nitride (III-N) materials have been widely used in optical devices such as blue light-emitting diodes today. On the other hand, III-N power electronics are also promising for the next-generation high-voltage and high-power applications because of the high breakdown voltage, high power handling capability, and high-temperature operation capability. The research involves the current development of III-N bipolar devices at Georgia Tech. The device design, fabrication process development, and device characterization are focused on different III-N bipolar devices: (1) GaN homojunction p-i-n rectifiers achieve a breakdown voltage >800 V with an extremely low specific on-resistance of 0.28 mΩ-cm2. The temperature-dependent characteristics of GaN p-i-n rectifiers will also be discussed. (2) The InGaN/GaN avalanche phototransistors (APTs) developed at GT demonstrate high responsivity (>300 A/W) and high ultraviolet-to-visible-band rejection ratio (>8×103) under UV light illumination. (3) The development of UV light emitters is also presented in the research works, including optically pumped DUV laser, electrically pumped DUV light emitting diodes (LEDs) and UV resonant-cavity LEDs.