Design of photomodifiable material systems for maskless patterning of functional ceramic and metallic materials at multiple length scales

Reactive ion etching;Positive tone resist;Silicon nanowires;Block copolymers;Laser interference ablation;Negative tone resist

Alabi, Taiwo Raphael ; Das, Suman Jacob, Karl Polymer, Textile and Fiber Engineering Griffin, Anselm Bucknall, David Beckham, Haskell W. ; Das, Suman

University:Georgia Institute of Technology

Department:Polymer, Textile and Fiber Engineering

关键词: Reactive ion etching;    Positive tone resist;    Silicon nanowires;    Block copolymers;    Laser interference ablation;    Negative tone resist;   

Others  :  https://smartech.gatech.edu/bitstream/1853/51709/1/Alabi_Taiwo_R_201305_PhD.pdf

美国|英语

来源: SMARTech Repository

【 摘 要 】

Silicon and silicon-based materials have been investigated for the fabrication of electronic, optoelectronic, solar, and structural/mechanical devices. To enable the continuous use of silicon-based materials for next generation device applications, new and inexpensive ways of fabricating features of silicon, and silica-based materials are needed. This dissertation investigates: 1) novel techniques for the fabrication of silica and silicon nanofeatures with potential application in the electronics and optoelectronics industry; 2) new designs of photomodifiable material systems (resists) for maskless patterning of silica filled composites for structural/mechanical applications. Sub-micron and nano-scaled features were fabricated onto silicon and silicon oxide substrates using a technique combining block copolymers and laser interference ablation. The sacrificial block copolymers are loaded with metallic salt precursors and patterned with a UV laser to generate device-oriented nanofeatures. New photopolymerizable material systems (negative tone resists) were developed based on curcumin photosensitizer and an epoxy-acrylate, vinylether, and vinylether-acrylate silica¬-loaded material systems. The cationic and radical mechanisms employed by the monomeric systems under a high vapor pressure mercury lamp source were investigated with several materials characterization techniques.