Heated atomic force microscope cantilever with high resistivity and improved temperature sensitivity for nanotopography sensing

Atomic-force microscope (AFM);cantilever;nanotopography

Liu, Joseph ; King ; William P.

关键词: Atomic-force microscope (AFM);    cantilever;    nanotopography;   

Others  :  https://www.ideals.illinois.edu/bitstream/handle/2142/44109/Joseph_Liu.pdf?sequence=1&isAllowed=y

美国|英语

来源: The Illinois Digital Environment for Access to Learning and Scholarship

【 摘 要 】

This thesis reports thermal nanotopography sensing with an atomic force microscope using a high-resistivity (HR) heated cantilever and a previously studied low-resistivity (LR) heated cantilever, with respective heater doping concentrations of 1 x 10^16 cm^-3 and 3 x 10^17 cm^-3. The HR cantilever temperature sensitivity on a 100 nm tall silicon grating improves by more than two times compared to the LR cantilever sensitivity in the range 100ºC – 300ºC. The HR cantilever achieves a sensitivity of 0.37 mV/nm at 300 ºC, compared to 0.15 mV/nm using the LR cantilever. The higher sensitivity can be attributed to the temperature coefficient of resistance of the HR cantilever having a value of 0.102 C^-1, a 13X increase over the LR cantilever value of 0.008 C^-1. The HR cantilever is shown to be better-suited than the LR cantilever for potential metrology applications, by thermally imaging a temperature-sensitive material, a 110 nm tall photoresist grating (AZ1518).