Subwavelength Elements and Plasmonic Structures for Spectral Filtering.

Plasmonics;Hyperbolic Metamaterial;Nanoimprint Lithography;Spectrum Filter;Nanophotonics;Electrical Engineering;Engineering;Electrical Engineering

Kaplan, Alexander FrankPhillips, Jamie Dean ;

University of Michigan

关键词: Plasmonics;    Hyperbolic Metamaterial;    Nanoimprint Lithography;    Spectrum Filter;    Nanophotonics;    Electrical Engineering;    Engineering;    Electrical Engineering;   

Others  :  https://deepblue.lib.umich.edu/bitstream/handle/2027.42/98050/afkaplan_1.pdf?sequence=1&isAllowed=y

瑞士|英语

来源: The Illinois Digital Environment for Access to Learning and Scholarship

【 摘 要 】

The ability to pattern smaller features on the sub-micron scale has allowed for constant improvements in the performance of electronics in recent decades, but it has also provided new possibilities for fabricating sub-wavelength optical devices. Standard optical structures such as Fabry-Perot resonators, waveguides, and anti-reflection materials can be created at scales much smaller than visible light (~400-750 nm), effectively generating new optical materials with properties such as high field concentration, wavelength filtering, and tailored absorption. Nanoimprint lithography provides a large-area, cost-effective tool for both testing and future manufacturing of periodic nanostructures that can be used in the above-mentioned applications. I will discuss the design, fabrication, and testing challenges encountered while creating/improving on optical devices with impressive capabilities, taking advantage of new understanding in physics at the nanoscale. The discussion will focus on previous work in color filtration and tailored absorption, high aspect-ratio UV blockers, and nanostructured Si for energy applications.