The construction of a new QCM-based flow reactor has been completed. Initial results include: (1) stable oscillation achieved with crystals sputter coated at 200 C with 500 nm ZnO; (2) sub-Hz noise level means << monolayer sensitivity; (3) Operation at elevated temperature possible after installation of membrane contactors; (4) determination of ZnO etch rates using dilute ethanolic NH(sub 4)Cl; (5) demonstration of use of an etchant as a probe of oxide-molecule interactions; (6) and use in flow rate-dependent CdS chemical deposition.