STRUCTURAL FLUCTUATIONS, ELECTRICAL RESPONSE AND THE RELIABILITY OF NANOSTRUCTURES (FINAL REPORT)

Rous, Philip J. ; Williams, Ellen D. ; Fuhrer, Michael S.

Univeristy of Maryland Baltimore County

关键词: Diffusion;    36 Materials Science;    Electrophoresis;    Nanostructures;    Reliability;   

DOI  :  10.2172/888736
RP-ID  :  DOE/ER/45939-1
RP-ID  :  FG02-01ER45939
RP-ID  :  888736

美国|英语

来源: UNT Digital Library

【 摘 要 】

The goal of the research supported by DOE-FG02-01ER45939 was to synthesize a number of experimental and theoretical approaches to understand the relationship between morphological fluctuations, the electrical response and the reliability (failure) of metallic nanostructures. The primary focus of our work was the study of metallic nanowires which we regard as prototypical of nanoscale interconnects. Our research plan has been to link together these materials properties and behaviors by understanding the phenomenon of, and the effects of electromigration at nanometer length scales. The thrust of our research has been founded on the concept that, for nanostructures where the surface-to-volume ratio is necessarily high, surface diffusion is the dominant mass transport mechanism that governs the fluctuations, electrical properties and failure modes of nanostructures. Our approach has been to develop experimental methods that permit the direct imaging of the electromagnetic distributions within nanostructures, their structural fluctuations and their electrical response. This experimental research is complemented by a parallel theoretical and computational program that describes the temporal evolution of nanostructures in response to current flow.