Final Report: Nanoscale Cluster Assembly on Compliant Substrates: A New Route to Epitaxy and Nanosctructure Synthesis

Weaver, John, H.

The Board of Trustees of the University of Illinois, Champaign, IL

关键词: Desorption;    Blag;    Diffusion;    Nanoparticles;    Epitaxy;   

DOI  :  10.2172/885433
RP-ID  :  DOE/ER/45944-FR.UIUC.A8523
RP-ID  :  FG02-01ER45944
RP-ID  :  885433

美国|英语

来源: UNT Digital Library

【 摘 要 】

From our work at the University of Minnesota prior to 2000, we knew that buffer-layer-assisted growth could be used to produce abrupt interfaces where reactions were constrained by the fact that particles derived from tens to millions of atoms were brought into contact with substrates that ranged from GaAs(110) to BiSrCaCuO superconductors. In situ scanning tunneling microscopy had demonstrated that the particles increased in size with the thickness of the buffer layer, and we postulated that buffer desorption somehow ‘tossed the particles around’ so that aggregation was possible. Through access to transmission electron microscopy in the MRL at the University of Illinois, we have been able to determine the distribution of particles delivered to amorphous carbon as a function of buffer thickness, buffer material, particle material, and warm up rate so as to reveal the physics underlying diffusion, aggregation, and coalescence. Significantly, this enhanced understanding makes it possible to design experiments that produce sizes and distributions of nanoparticles of a very wide range of materials.