Novel Laser Ablation Technology for Surface Decontamination

Cheng, Chung H.

Oak Ridge National Laboratory

关键词: Removal;    Surface Cleaning;    Decontamination;    Economics;    Ablation;   

DOI  :  10.2172/839149
RP-ID  :  EMSP-82803--2004
RP-ID  :  839149

美国|英语

来源: UNT Digital Library

【 摘 要 】

Laser ablation for surface cleaning has been pursued for the removal of paint on airplanes. It has also been pursued for the cleaning of semiconductor surfaces. However, all these approaches have been pursued by laser ablation in air. For highly contaminated surface, laser ablation in air can easily cause secondary contamination. Thus it is not suitable to apply to achieve surface decontamination for DOE facilities since many of these facilities have radioactive contaminants on the surface. Any secondary contamination will be a grave concern. The objective of this project is to develop a novel technology for laser ablation in liquid for surface decontamination. It aims to achieve more efficient surface decontamination without secondary contamination and to evaluate the economic feasibility for large scale surface decontamination with laser ablation in liquid. When laser ablation is pursued in the solution, all the desorbed contaminants will be confined in liquid. The contaminants can be precipitated and subsequently contained in a small volume for disposal. It can reduce the risk of the decontamination workers. It can also reduce the volume of contaminants dramatically.