Mini RF-driven ion source for focused ion beam system

Jiang, X. ; Ji, Q. ; Chang, A. ; Leung, K.N.

Lawrence Berkeley National Laboratory

关键词: Ion Sources;    08 Hydrogen;    Electrostatics;    70 Plasma Physics And Fusion Technology;    Current Density;   

DOI  :  10.2172/802041
RP-ID  :  LBNL--51251
RP-ID  :  AC03-76SF00098
RP-ID  :  802041

美国|英语

来源: UNT Digital Library

【 摘 要 】

Mini RF-driven ion sources with 1.2 cm and 1.5 cm inner chamber diameter have been developed at Lawrence Berkeley National Laboratory. Several gas species have been tested including argon, krypton and hydrogen. These mini ion sources operate in inductively coupled mode and are capable of generating high current density ion beams at tens of watts. Since the plasma potential is relatively low in the plasma chamber, these mini ion sources can function reliably without any perceptible sputtering damage. The mini RF-driven ion sources will be combined with electrostatic focusing columns, and are capable of producing nano focused ion beams for micro machining and semiconductor fabrications.