Quarterly Report for High NA Optics Development: Q4-1999 International Sematech Project LITH 112

Taylor, J.S.

Lawrence Livermore National Laboratory

关键词: 70 Plasma Physics And Fusion Technology;    Specifications;    Planning;    Construction;    Design;   

DOI  :  10.2172/792628
RP-ID  :  UCRL-ID-137386-99-4
RP-ID  :  W-7405-Eng-48
RP-ID  :  792628

美国|英语

来源: UNT Digital Library

【 摘 要 】

This quarterly report provides a status update for each of the milestones for the International Sematech project on the development of high-NA optics for a small-field EUVL exposure tool. Accomplishments this quarter include aerial image calculations, specifications for multilayer coatings, specification of the M2 substrate, and design of fixturing for M2, and the design of the metrology mount for M2. The optical fabrication vendor, Carl Zeiss, has completed the construction of an interferometer for use in fabricating the M1 substrate and reports a test-to-test repeatability of 0.06 nm rms. However, the simultaneous achievement of figure and finish is requiring longer than anticipated, which will extend the M1 delivery date to the end of Ql-2000. Zeiss is planning to process substrates M1 and M2 in parallel and currently does not project a slip in their overall schedule.