The Reaction Kinetics of LiD with Water Vapor

Balooch, M ; Dinh, L N ; Calef, D F

Lawrence Livermore National Laboratory

关键词: Partial Pressure;    Scanning Electron Microscopy;    Water Vapor;    Thermal Gravimetric Analysis;    36 Materials Science;   

DOI  :  10.2172/15005289
RP-ID  :  UCRL-ID-143491
RP-ID  :  W-7405-ENG-48
RP-ID  :  15005289

美国|英语

来源: UNT Digital Library

【 摘 要 】

The interaction of LiD with water vapor in the partial pressure range of 10{sup -7} Torr to 20 Torr has been investigated. The reaction probability of water with pure LiD cleaved in an ultra high vacuum environment was obtained using the modulated molecular beam technique. This probability was 0.11 and independent of LiD surface temperature suggesting a negligible activation energy for the reaction in agreement with quantum chemical calculations. The value gradually reduced, however, to .007 as the surface concentration of oxygen containing product (LiOH), which was monitored in-situ by Auger electron spectroscopy on the reaction zone, approached full coverage. As the hydroxide film grew beyond a monolayer, the phase lag of hydrogen product increased from zero to 20 degrees and the reaction probability reduced further until it approached our detection limit ({approx} 10{sup -4}). This phase lag was attributed to a diffusion limited process in this regime. In separate experiments, the film growth has been studied in nitrogen atmosphere with 100% relative humidity using thermogravimetric analysis (TGA) and in air with 50% relative humidity utilizing scanning electron microscopy (SEM). For exposures to environment with high water concentrations and for micrometer thick films, the reaction probability reduced to 4 x 10{sup -7} and was independent of exposure time, The lattice diffusion through the film was no longer controlling the transport of water to the LiD/LiOH interface. Microcracks generated in the film to release stress provided easier pathways to the interface. A modified microscope, capable of both atomic force microscopy (AFM) and nanoindentation, was employed to investigate the surface morphology of LiOH.H{sub 2}O grown on LiOH at high water vapor partial pressures and the kinetics of this growth.