Evaluation of the residue from microset on various metal surfaces.

Brumbach, Michael Todd

关键词: ADHESION;    CONTAMINATION;    DEFECTS;    EVALUATION;    REMOVAL;    RESIDUES;    RUBBERS;    SUBSTRATES;    THICKNESS;    X-RAY PHOTOELECTRON SPECTROSCOPY;   

DOI  :  10.2172/1013785
RP-ID  :  SAND2011-2828
PID  :  OSTI ID: 1013785
Others  :  TRN: US201111%%139

学科分类：材料科学（综合）

美国|英语

来源: SciTech Connect

【 摘 要 】

Fast-curing impression materials are sometimes used to cast negative-mold replications of physical defects on material surfaces. The negative-mold impressions can then be used for further measurements to record the nature of the defect. These impression materials have been designed to cure quickly, and with very low adhesion, so that they can be easily removed from the surface leaving little residual contamination. Unfortunately, some contaminant is retained by the substrate material. This investigation seeks to identify the composition and quantity of the remaining material upon removal of Microset Synthetic Rubber Replicating Compound from several material surfaces. Coe-Flex was used as a relative comparison to Microset. On fifteen different substrate materials the Microset leaves no visible trace of contaminant, however, X-ray photoelectron spectroscopy shows evidence of a thin silicone-based contaminant film of approximately 2 nm thickness.