NEXT GENERATION SOLVENT-MATERIALS COMPATIBILITY WITH POLYMER COMPONENTS WITHIN MODULAR CAUSTIC-SIDE SOLVENT EXTRACTION UNIT (FINAL REPORT)

Fondeur, F. ; Peters, T. ; Fink, S.

关键词: AR FACILITIES;    ADSORPTION;    CESIUM;    COMPATIBILITY;    COPOLYMERS;    DIFFUSION;    LEACHATES;    ORGANIC POLYMERS;    ORGANIC SOLVENTS;    POLYMERS;    POROSITY;    REMOVAL;    SOLVENT EXTRACTION;    SOLVENTS;    STABILITY;    TARGETS;    TESTING;    VALVES;    VERIFICATION;    WASTE PROCESSING;   

DOI  :  10.2172/1033751
RP-ID  :  SRNL-STI-2011-00575R1
PID  :  OSTI ID: 1033751
Others  :  TRN: US1200662

学科分类：核能源与工程

美国|英语

来源: SciTech Connect

【 摘 要 】

The Office of Waste Processing, within the Office of Technology Innovation and Development, is funding the development of an enhanced solvent for deployment at the Savannah River Site for removal of cesium from High Level Waste. The technical effort is collaboration between Oak Ridge National Laboratory (ORNL), Savannah River National Laboratory (SRNL), and Argonne National Laboratory. The first deployment target for the technology is within the Modular Caustic-Side Solvent Extraction Unit (MCU). Deployment of a new chemical within an existing facility requires verification that the chemical components are compatible with the installed equipment. In the instance of a new organic solvent, the primary focus is on compatibility of the solvent with organic polymers used in the facility. This report provides the data from exposing these polymers to the Next Generation Solvent (NGS). The test was conducted over six months. An assessment of the dimensional stability of polymers present in MCU (i.e., PEEK, Grafoil, Tefzel and Isolast) in the modified NGS (where the concentration of LIX{reg_sign}79 and MaxCalix was varied systematically) showed that LIX{reg_sign}79 selectively affected Tefzel and its different grades (by an increase in size and lowering its density). The copolymer structure of Tefzel and possibly its porosity allows for the easier diffusion of LIX{reg_sign}79. Tefzel is used as the seat material in some of the valves at MCU. Long term exposure to LIX{reg_sign}79, may make the valves hard to operate over time due to the seat material (Tefzel) increasing in size. However, since the physical changes of Tefzel in the improved solvent are comparable to the changes in the CSSX baseline solvent, no design changes are needed with respect to the Tefzel seating material. PEEK, Grafoil and Isolast were not affected by LIX{reg_sign}79 and MaxCalix within six months of exposure. The initial rapid weight gain observed in every polymer is assigned to the finite and limited uptake of Isopar{reg_sign} L/Modifier by the polymers probably due to the polymers porosity and rough surfaces. Spectroscopic data on the organic liquid and the polymer surfaces showed no preferential adsorption of any component in the NGS to the polymers and with the exception of CPVC, no leachate was observed in the NGS from any of the polymers studied. The testing shows no major concerns for compatibility over the short duration of these tests but does indicate that longer duration exposure studies are warranted, especially for Tefzel. However, the physical changes experienced by Tefzel in the improved solvent were comparable to the physical changes obtained when Tefzel is placed in CSSX baseline solvent. Therefore, there is no effect of the improved solvent beyond those observed in CSSX baseline solvent.