Steady State Sputtering Yields and Surface Compositions of Depleted Uranium and Uranium Carbide bombarded by 30 keV Gallium or 16 keV Cesium Ions.

Siekhaus, W. J.¹  Teslich, N. E.¹  Weber, P. K.² 

[1]Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)

[2]Lawrence Livermore National Lab. (LLNL), Livermore, CA (United

关键词: DEPLETED URANIUM;    URANIUM CARBIDES;    CESIUM IONS;    KEV RANGE;    GALLIUM IONS;    SPUTTERING;    STEADY-STATE CONDITIONS;    YIELDS;    INCLUSIONS;    ION IMPLANTATION;    SURFACES;    CHEMICAL COMPOSITION;   

DOI  :  10.2172/1184161
RP-ID  :  LLNL--TR-667466
PID  :  OSTI ID: 1184161
Others  :  TRN: US1500304

学科分类：凝聚态物理

美国|英语

来源: SciTech Connect

【 摘 要 】

Depleted uranium that included carbide inclusions was sputtered with 30-keV gallium ions or 16-kev cesium ions to depths much greater than the ions??? range, i.e. using steady-state sputtering. The recession of both the uranium???s and uranium carbide???s surfaces and the ion corresponding fluences were used to determine the steady-state target sputtering yields of both uranium and uranium carbide, i.e. 6.3 atoms of uranium and 2.4 units of uranium carbide eroded per gallium ion, and 9.9 uranium atoms and 3.65 units of uranium carbide eroded by cesium ions. The steady state surface composition resulting from the simultaneous gallium or cesium implantation and sputter-erosion of uranium and uranium carbide were calculated to be U??????Ga??????, (UC)??????Ga?????? and U??????Cs???, (UC)??????Cs??????, respectively.