期刊论文详细信息
JOURNAL OF ALLOYS AND COMPOUNDS 卷:854
Microstructural influence of the thermal behavior of arc deposited TiAlN coatings with high aluminum content
Article
Chaar, A. B. B.1,2  Rogstrom, L.1  Johansson-Joesaar, M. P.1,3  Barrirero, J.1,2  Aboulfadl, H.2,4  Schell, N.5  Ostach, D.5  Mucklich, F.2  Oden, M.1 
[1] Linkoping Univ, Dept Phys Chem & Biol, Nanostruct Mat, SE-58183 Linkoping, Sweden
[2] Saarland Univ, Dept Mat Sci, D-66123 Saarbrucken, Germany
[3] Seco Tools AB, SE-73782 Fagersta, Sweden
[4] Chalmers Univ Technol, Dept Phys, SE-41296 Gothenburg, Sweden
[5] Helmholtz Zentrum Geesthacht, Inst Mat Res, D-21502 Geesthacht, Germany
关键词: Coating materials;    Microstructure;    Vapor deposition;    Synchrotron radiation;   
DOI  :  10.1016/j.jallcom.2020.157205
来源: Elsevier
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【 摘 要 】

The influence of the microstructure on the thermal behavior of cathodic arc deposited TiAlN coatings was studied as a function of isothermal annealing. Two compositionally similar but structurally different coatings were compared, a Ti0.34Al0.66N0.96 coating with a fine-grain structure consisting of a mixture of cubic (c) and hexagonal (h) phases, and a Ti0.40Al0.60N0.94 coating with a coarse-grain structure of cubic phase. By in situ wide-angle synchrotron x-ray scattering, spinodal decomposition was confirmed in both coatings. The increased amount of internal interfaces lowered the decomposition temperature by 50 degrees C for the dual-phase coating. During the subsequent isothermal anneal at 1000 degrees C, a transformation from c-AlN to h-AlN took place in both coatings. After 50 min of isothermal annealing, atom probe tomography detected small amounts of Al (similar to 2 at.%) in the c-TiN rich domains and small amounts of Ti (similar to 1 at.%) in the h-AlN rich domains of the coarse-grained single-phase Ti0.40Al0.60N0.94 coating. Similarly, at the same conditions, the fine-grained dual-phase Ti0.34Al0.66N0.96 coating exhibits a higher Al content (similar to 5 at.%) in the c-TiN rich domains and higher Ti content (similar to 15 at.%) in the h-AlN rich domains. The study shows that the thermal stability of TiAlN is affected by the microstructure and that it can be used to tune the reaction pathway of decomposition favorably. (C) 2020 The Authors. Published by Elsevier B.V.

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